Hinsberg WD - Search Results

1

Fundamental understanding of chemical processes in extreme ultraviolet resist materials.

Kostko O, Xu B, Ahmed M, Slaughter DS, Ogletree DF, Closser KD, Prendergast DG, Naulleau P, Olynick DL, Ashby PD, Liu Y, Hinsberg WD, Wallraff GM. Kostko O, et al. Among authors: hinsberg wd. J Chem Phys. 2018 Oct 21;149(15):154305. doi: 10.1063/1.5046521. J Chem Phys. 2018. PMID: 30342450

2

Lithographic Imaging Techniques for the Formation of Nanoscopic Features.

Wallraff GM, Hinsberg WD. Wallraff GM, et al. Among authors: hinsberg wd. Chem Rev. 1999 Jul 14;99(7):1801-1822. doi: 10.1021/cr980003i. Chem Rev. 1999. PMID: 11849011 No abstract available.

3

Diffusive confinement of free radical intermediates in the OH radical oxidation of semisolid aerosols.

Wiegel AA, Liu MJ, Hinsberg WD, Wilson KR, Houle FA. Wiegel AA, et al. Among authors: hinsberg wd. Phys Chem Chem Phys. 2017 Mar 1;19(9):6814-6830. doi: 10.1039/c7cp00696a. Phys Chem Chem Phys. 2017. PMID: 28218326

4

Block copolymer based nanostructures: materials, processes, and applications to electronics.

Kim HC, Park SM, Hinsberg WD. Kim HC, et al. Among authors: hinsberg wd. Chem Rev. 2010 Jan;110(1):146-77. doi: 10.1021/cr900159v. Chem Rev. 2010. PMID: 19950962 No abstract available.

5

Stochastic methods for aerosol chemistry: a compact molecular description of functionalization and fragmentation in the heterogeneous oxidation of squalane aerosol by OH radicals.

Wiegel AA, Wilson KR, Hinsberg WD, Houle FA. Wiegel AA, et al. Among authors: hinsberg wd. Phys Chem Chem Phys. 2015 Feb 14;17(6):4398-411. doi: 10.1039/c4cp04927f. Phys Chem Chem Phys. 2015. PMID: 25578323 Free article.

6

Oxidation of a model alkane aerosol by OH radical: the emergent nature of reactive uptake.

Houle FA, Hinsberg WD, Wilson KR. Houle FA, et al. Among authors: hinsberg wd. Phys Chem Chem Phys. 2015 Feb 14;17(6):4412-23. doi: 10.1039/c4cp05093b. Phys Chem Chem Phys. 2015. PMID: 25578745

7

Light-directed synthesis of high-density oligonucleotide arrays using semiconductor photoresists.

McGall G, Labadie J, Brock P, Wallraff G, Nguyen T, Hinsberg W. McGall G, et al. Proc Natl Acad Sci U S A. 1996 Nov 26;93(24):13555-60. doi: 10.1073/pnas.93.24.13555. Proc Natl Acad Sci U S A. 1996. PMID: 8942972 Free PMC article.

8

Oriented mesoporous organosilicate thin films.

Freer EM, Krupp LE, Hinsberg WD, Rice PM, Hedrick JL, Cha JN, Miller RD, Kim HC. Freer EM, et al. Among authors: hinsberg wd. Nano Lett. 2005 Oct;5(10):2014-8. doi: 10.1021/nl051517h. Nano Lett. 2005. PMID: 16218729

9

Method of measuring the spatial resolution of a photoresist.

Hoffnagle JA, Hinsberg WD, Sanchez MI, Houle FA. Hoffnagle JA, et al. Among authors: hinsberg wd. Opt Lett. 2002;27(20):1776-8. doi: 10.1364/ol.27.001776. Opt Lett. 2002. PMID: 18033360

10

Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist.

Cheng JY, Sanders DP, Truong HD, Harrer S, Friz A, Holmes S, Colburn M, Hinsberg WD. Cheng JY, et al. Among authors: hinsberg wd. ACS Nano. 2010 Aug 24;4(8):4815-23. doi: 10.1021/nn100686v. ACS Nano. 2010. PMID: 20731456

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