Naulleau P - Search Results

1

Fundamental understanding of chemical processes in extreme ultraviolet resist materials.

Kostko O, Xu B, Ahmed M, Slaughter DS, Ogletree DF, Closser KD, Prendergast DG, Naulleau P, Olynick DL, Ashby PD, Liu Y, Hinsberg WD, Wallraff GM. Kostko O, et al. Among authors: naulleau p. J Chem Phys. 2018 Oct 21;149(15):154305. doi: 10.1063/1.5046521. J Chem Phys. 2018. PMID: 30342450

2

The importance of inner-shell electronic structure for enhancing the EUV absorption of photoresist materials.

Closser KD, Ogletree DF, Naulleau P, Prendergast D. Closser KD, et al. Among authors: naulleau p. J Chem Phys. 2017 Apr 28;146(16):164106. doi: 10.1063/1.4981815. J Chem Phys. 2017. PMID: 28456207

3

Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning.

Ashby PD, Olynick DL, Ogletree DF, Naulleau PP. Ashby PD, et al. Among authors: naulleau pp. Adv Mater. 2015 Oct 14;27(38):5813-9. doi: 10.1002/adma.201501171. Epub 2015 Jun 16. Adv Mater. 2015. PMID: 26079187

4

Mechanistic Advantages of Organotin Molecular EUV Photoresists.

Ma JH, Needham C, Wang H, Neureuther A, Prendergast D, Naulleau P. Ma JH, et al. Among authors: naulleau p. ACS Appl Mater Interfaces. 2022 Feb 2;14(4):5514-5524. doi: 10.1021/acsami.1c12411. Epub 2022 Jan 24. ACS Appl Mater Interfaces. 2022. PMID: 35073690

5

Additive Lithography-Organic Monolayer Patterning Coupled with an Area-Selective Deposition.

Wojtecki R, Ma J, Cordova I, Arellano N, Lionti K, Magbitang T, Pattison TG, Zhao X, Delenia E, Lanzillo N, Hess AE, Nathel NF, Bui H, Rettner C, Wallraff G, Naulleau P. Wojtecki R, et al. Among authors: naulleau p. ACS Appl Mater Interfaces. 2021 Feb 24;13(7):9081-9090. doi: 10.1021/acsami.0c16817. Epub 2021 Jan 20. ACS Appl Mater Interfaces. 2021. PMID: 33471496

6

At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems.

Naulleau P, Goldberg KA, Gullikson EM, Bokor J. Naulleau P, et al. Appl Opt. 2000 Jun 10;39(17):2941-7. doi: 10.1364/ao.39.002941. Appl Opt. 2000. PMID: 18345220

7

Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresist.

Naulleau PP. Naulleau PP. Appl Opt. 2004 Feb 1;43(4):788-92. doi: 10.1364/ao.43.000788. Appl Opt. 2004. PMID: 14960071

8

Design, fabrication, and characterization of high-efficiency extreme-ultraviolet diffusers.

Naulleau PP, Liddle JA, Salmassi F, Anderson EH, Gullikson EM. Naulleau PP, et al. Appl Opt. 2004 Oct 1;43(28):5323-9. doi: 10.1364/ao.43.005323. Appl Opt. 2004. PMID: 15495422

9

Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography.

Naulleau PP. Naulleau PP. Appl Opt. 2009 Jun 20;48(18):3302-7. doi: 10.1364/ao.48.003302. Appl Opt. 2009. PMID: 19543335 Free article.

10

Absolute sensitivity calibration of extreme ultraviolet photoresists.

Naulleau PP, Gullikson EM, Aquila A, George S, Niakoula D. Naulleau PP, et al. Opt Express. 2008 Jul 21;16(15):11519-24. Opt Express. 2008. PMID: 18648473 Free article.

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