Olynick DL - Search Results

1

Fundamental understanding of chemical processes in extreme ultraviolet resist materials.

Kostko O, Xu B, Ahmed M, Slaughter DS, Ogletree DF, Closser KD, Prendergast DG, Naulleau P, Olynick DL, Ashby PD, Liu Y, Hinsberg WD, Wallraff GM. Kostko O, et al. Among authors: olynick dl. J Chem Phys. 2018 Oct 21;149(15):154305. doi: 10.1063/1.5046521. J Chem Phys. 2018. PMID: 30342450

2

Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning.

Ashby PD, Olynick DL, Ogletree DF, Naulleau PP. Ashby PD, et al. Among authors: olynick dl. Adv Mater. 2015 Oct 14;27(38):5813-9. doi: 10.1002/adma.201501171. Epub 2015 Jun 16. Adv Mater. 2015. PMID: 26079187

3

Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithography.

Kulshreshtha PK, Maruyama K, Kiani S, Blackwell J, Olynick DL, Ashby PD. Kulshreshtha PK, et al. Among authors: olynick dl. Nanotechnology. 2014 Aug 8;25(31):315301. doi: 10.1088/0957-4484/25/31/315301. Epub 2014 Jul 15. Nanotechnology. 2014. PMID: 25026410

4

Interface segregating fluoralkyl-modified polymers for high-fidelity block copolymer nanoimprint lithography.

Voet VS, Pick TE, Park SM, Moritz M, Hammack AT, Urban JJ, Ogletree DF, Olynick DL, Helms BA. Voet VS, et al. Among authors: olynick dl. J Am Chem Soc. 2011 Mar 9;133(9):2812-5. doi: 10.1021/ja1094292. Epub 2011 Feb 15. J Am Chem Soc. 2011. PMID: 21322559

5

Complex Materials by Atomic Layer Deposition.

Schwartzberg AM, Olynick D. Schwartzberg AM, et al. Adv Mater. 2015 Oct 14;27(38):5778-84. doi: 10.1002/adma.201500699. Epub 2015 May 27. Adv Mater. 2015. PMID: 26016695

6

Sub-10 nm nanofabrication via nanoimprint directed self-assembly of block copolymers.

Park SM, Liang X, Harteneck BD, Pick TE, Hiroshiba N, Wu Y, Helms BA, Olynick DL. Park SM, et al. Among authors: olynick dl. ACS Nano. 2011 Nov 22;5(11):8523-31. doi: 10.1021/nn201391d. Epub 2011 Oct 26. ACS Nano. 2011. PMID: 21995511

7

Investigation of phonon coherence and backscattering using silicon nanomeshes.

Lee J, Lee W, Wehmeyer G, Dhuey S, Olynick DL, Cabrini S, Dames C, Urban JJ, Yang P. Lee J, et al. Among authors: olynick dl. Nat Commun. 2017 Jan 4;8:14054. doi: 10.1038/ncomms14054. Nat Commun. 2017. PMID: 28051081 Free PMC article.

8

Sub-20 nm laser ablation for lithographic dry development.

de Oteyza DG, Perera PN, Schmidt M, Falch M, Dhuey SD, Harteneck BD, Schwartzberg AM, Schuck PJ, Cabrini S, Olynick DL. de Oteyza DG, et al. Among authors: olynick dl. Nanotechnology. 2012 May 11;23(18):185301. doi: 10.1088/0957-4484/23/18/185301. Epub 2012 Apr 13. Nanotechnology. 2012. PMID: 22498667

9

Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features.

Dallorto S, Staaks D, Schwartzberg A, Yang X, Lee KY, Rangelow IW, Cabrini S, Olynick DL. Dallorto S, et al. Among authors: olynick dl. Nanotechnology. 2018 Oct 5;29(40):405302. doi: 10.1088/1361-6528/aad393. Epub 2018 Jul 16. Nanotechnology. 2018. PMID: 30010091

10

Low temperature dry etching of chromium towards control at sub-5 nm dimensions.

Staaks D, Yang X, Lee KY, Dhuey SD, Sassolini S, Rangelow IW, Olynick DL. Staaks D, et al. Among authors: olynick dl. Nanotechnology. 2016 Oct 14;27(41):415302. doi: 10.1088/0957-4484/27/41/415302. Epub 2016 Sep 8. Nanotechnology. 2016. PMID: 27606715

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