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Unveiling the double-well energy landscape in a ferroelectric layer.
Hoffmann M, Fengler FPG, Herzig M, Mittmann T, Max B, Schroeder U, Negrea R, Lucian P, Slesazeck S, Mikolajick T. Hoffmann M, et al. Among authors: schroeder u. Nature. 2019 Jan;565(7740):464-467. doi: 10.1038/s41586-018-0854-z. Epub 2019 Jan 14. Nature. 2019. PMID: 30643206
Electric field cycling behavior of ferroelectric hafnium oxide.
Schenk T, Schroeder U, Pešić M, Popovici M, Pershin YV, Mikolajick T. Schenk T, et al. Among authors: schroeder u. ACS Appl Mater Interfaces. 2014 Nov 26;6(22):19744-51. doi: 10.1021/am504837r. Epub 2014 Nov 14. ACS Appl Mater Interfaces. 2014. PMID: 25365475
Ferroelectricity and antiferroelectricity of doped thin HfO2-based films.
Park MH, Lee YH, Kim HJ, Kim YJ, Moon T, Kim KD, Müller J, Kersch A, Schroeder U, Mikolajick T, Hwang CS. Park MH, et al. Among authors: schroeder u. Adv Mater. 2015 Mar 18;27(11):1811-31. doi: 10.1002/adma.201404531. Epub 2015 Feb 11. Adv Mater. 2015. PMID: 25677113
Dynamic leakage current compensation revisited.
Schenk T, Schroeder U, Mikolajick T. Schenk T, et al. Among authors: schroeder u. IEEE Trans Ultrason Ferroelectr Freq Control. 2015 Mar;62(3):596-9. doi: 10.1109/TUFFC.2014.006774. IEEE Trans Ultrason Ferroelectr Freq Control. 2015. PMID: 25768825
Complex Internal Bias Fields in Ferroelectric Hafnium Oxide.
Schenk T, Hoffmann M, Ocker J, Pešić M, Mikolajick T, Schroeder U. Schenk T, et al. Among authors: schroeder u. ACS Appl Mater Interfaces. 2015 Sep 16;7(36):20224-33. doi: 10.1021/acsami.5b05773. Epub 2015 Sep 1. ACS Appl Mater Interfaces. 2015. PMID: 26308500
Breakdown and Protection of ALD Moisture Barrier Thin Films.
Nehm F, Klumbies H, Richter C, Singh A, Schroeder U, Mikolajick T, Mönch T, Hoßbach C, Albert M, Bartha JW, Leo K, Müller-Meskamp L. Nehm F, et al. Among authors: schroeder u. ACS Appl Mater Interfaces. 2015 Oct 14;7(40):22121-7. doi: 10.1021/acsami.5b06891. Epub 2015 Sep 30. ACS Appl Mater Interfaces. 2015. PMID: 26399760
Effect of Zr Content on the Wake-Up Effect in Hf1-xZrxO2 Films.
Park MH, Kim HJ, Kim YJ, Lee YH, Moon T, Kim KD, Hyun SD, Fengler F, Schroeder U, Hwang CS. Park MH, et al. Among authors: schroeder u. ACS Appl Mater Interfaces. 2016 Jun 22;8(24):15466-75. doi: 10.1021/acsami.6b03586. Epub 2016 Jun 9. ACS Appl Mater Interfaces. 2016. PMID: 27237137
Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors.
Mulaosmanovic H, Ocker J, Müller S, Schroeder U, Müller J, Polakowski P, Flachowsky S, van Bentum R, Mikolajick T, Slesazeck S. Mulaosmanovic H, et al. Among authors: schroeder u. ACS Appl Mater Interfaces. 2017 Feb 1;9(4):3792-3798. doi: 10.1021/acsami.6b13866. Epub 2017 Jan 24. ACS Appl Mater Interfaces. 2017. PMID: 28071052
113 results