The Study of Reactive Ion Etching of Heavily Doped Polysilicon Based on HBr/O2/He Plasmas for Thermopile Devices.
Zhou N, Li J, Mao H, Liu H, Liu J, Gao J, Xiang J, Hu Y, Shi M, Ju J, Lei Y, Yang T, Li J, Wang W.
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Materials (Basel). 2020 Sep 25;13(19):4278. doi: 10.3390/ma13194278.
Materials (Basel). 2020.
PMID: 32992794
Free PMC article.