Patterning at the Resolution Limit of Commercial Electron Beam Lithography.
Saifullah MSM, Asbahi M, Neo DCJ, Mahfoud Z, Tan HR, Ha ST, Dwivedi N, Dutta T, Bin Dolmanan S, Aabdin Z, Bosman M, Ganesan R, Tripathy S, Hasko DG, Valiyaveettil S.
Saifullah MSM, et al. Among authors: ha st.
Nano Lett. 2022 Sep 28;22(18):7432-7440. doi: 10.1021/acs.nanolett.2c02339. Epub 2022 Sep 7.
Nano Lett. 2022.
PMID: 36069429