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Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers.
Chevalier X, Gomes Correia C, Pound-Lana G, Bézard P, Sérégé M, Petit-Etienne C, Gay G, Cunge G, Cabannes-Boué B, Nicolet C, Navarro C, Cayrefourcq I, Müller M, Hadziioannou G, Iliopoulos I, Fleury G, Zelsmann M. Chevalier X, et al. Among authors: zelsmann m. ACS Appl Mater Interfaces. 2021 Mar 10;13(9):11224-11236. doi: 10.1021/acsami.1c00694. Epub 2021 Feb 23. ACS Appl Mater Interfaces. 2021. PMID: 33621463
An Ultra-Thin Near-Perfect Absorber via Block Copolymer Engineered Metasurfaces.
Cummins C, Flamant Q, Dwivedi R, Alvarez-Fernandez A, Demazy N, Bentaleb A, Pound-Lana G, Zelsmann M, Barois P, Hadziioannou G, Baron A, Fleury G, Ponsinet V. Cummins C, et al. Among authors: zelsmann m. J Colloid Interface Sci. 2022 Mar;609:375-383. doi: 10.1016/j.jcis.2021.11.163. Epub 2021 Nov 29. J Colloid Interface Sci. 2022. PMID: 34902674
20 results