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Ultrahigh-printing-speed photoresists for additive manufacturing.
Liu T, Tao P, Wang X, Wang H, He M, Wang Q, Cui H, Wang J, Tang Y, Tang J, Huang N, Kuang C, Xu H, He X. Liu T, et al. Among authors: wang x, wang h, wang j, wang q. Nat Nanotechnol. 2024 Jan;19(1):51-57. doi: 10.1038/s41565-023-01517-w. Epub 2023 Oct 2. Nat Nanotechnol. 2024. PMID: 37783856
Exceptional Light Sensitivity by Thiol-Ene Click Lithography.
Wang Q, Cui H, Wang X, Hu Z, Tao P, Li M, Wang J, Tang Y, Xu H, He X. Wang Q, et al. Among authors: wang x, wang j. J Am Chem Soc. 2023 Feb 8;145(5):3064-3074. doi: 10.1021/jacs.2c11887. Epub 2023 Jan 10. J Am Chem Soc. 2023. PMID: 36625511
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