Yeom GY - Search Results

1

Etch characteristics of maskless oxide/nitride/oxide/nitride (ONON) stacked structure using C₄H₂F₆-based gas.

Cho NI, Hong JW, Yoo HJ, Eoh HJ, Kim CH, Jeong JW, Kim KL, Kwak JH, Cho YJ, Kim DW, Yeom GY. Cho NI, et al. Among authors: yeom gy. Sci Rep. 2024 Oct 2;14(1):22900. doi: 10.1038/s41598-024-74107-y. Sci Rep. 2024. PMID: 39358416 Free PMC article.

2

Monolithic DNApatite: An Elastic Apatite with Sub-Nanometer Scale Organo-Inorganic Structures.

Lee JW, Lee B, Park CH, Heo JH, Lee TY, Lee D, Bae J, Sundharbaabu PR, Yeom WK, Chae S, Lim JH, Lee SW, Choi JS, Bae HB, Choi JY, Lee EH, Yoon DS, Yeom GY, Shin H, Lee JH. Lee JW, et al. Among authors: yeom gy. Adv Mater. 2024 Oct;36(41):e2406179. doi: 10.1002/adma.202406179. Epub 2024 Jul 14. Adv Mater. 2024. PMID: 39003621

3

Effect of Cl₂ Radical on Dry Development of Spin-Coated Metal Oxide Resist.

Namgoong S, Kim HJ, Kang YK, Kim MC, Jang YJ, Tak H, Kang JE, Lee SJ, Kim MG, Kim D, Yeom GY. Namgoong S, et al. Among authors: yeom gy. ACS Appl Mater Interfaces. 2024 Sep 25;16(38):51690-51698. doi: 10.1021/acsami.4c10523. Epub 2024 Sep 12. ACS Appl Mater Interfaces. 2024. PMID: 39265086

4

Biocompatible Co-organic Composite Thin Film Deposited by VHF Plasma-Enhanced Atomic Layer Deposition at a Low Temperature.

Yeom WK, Lee JW, Bae JA, Sung DI, Kim T, Lee JH, Yeom GY. Yeom WK, et al. Among authors: yeom gy. ACS Omega. 2024 Jul 23;9(31):33735-33742. doi: 10.1021/acsomega.4c02845. eCollection 2024 Aug 6. ACS Omega. 2024. PMID: 39130588 Free PMC article.

5

Effect of Bias Frequency on Bottom-Up SiO₂ Gap-Filling Using Plasma-Enhanced Atomic Layer Deposition.

Shin YJ, Kim HG, Choi SY, Kim SM, Kang JE, Han HW, Kim JM, Kim GH, Yeom GY. Shin YJ, et al. Among authors: yeom gy. ACS Appl Mater Interfaces. 2024 Aug 7;16(31):41642-41652. doi: 10.1021/acsami.4c06106. Epub 2024 Jul 29. ACS Appl Mater Interfaces. 2024. PMID: 39069792

6

Plasma enhanced atomic layer deposition of silicon nitride using magnetized very high frequency plasma.

Ji YJ, Kim HI, Kang JE, Choi SY, Kim KH, Kim DS, Ellingboe AR, Kim HM, Yeom GY, Kim DW. Ji YJ, et al. Among authors: yeom gy. Nanotechnology. 2024 Apr 18;35(27). doi: 10.1088/1361-6528/ad3740. Nanotechnology. 2024. PMID: 38522102

7

Characterization of SiO₂ Plasma Etching with Perfluorocarbon (C₄F₈ and C₆F₆) and Hydrofluorocarbon (CHF₃ and C₄H₂F₆) Precursors for the Greenhouse Gas Emissions Reduction.

Choi M, Lee Y, You Y, Cho C, Jeong W, Seong I, Choi B, Kim S, Seol Y, You S, Yeom GY. Choi M, et al. Among authors: yeom gy. Materials (Basel). 2023 Aug 14;16(16):5624. doi: 10.3390/ma16165624. Materials (Basel). 2023. PMID: 37629915 Free PMC article.

8

Highly selective etching of SiN_xover SiO₂using ClF₃/Cl₂remote plasma.

Yoo SJ, Kang JE, Ji YJ, Tak HW, Cho BO, Kim YL, Lee KC, Chun JS, Kim Y, Kim DW, Yeom GY. Yoo SJ, et al. Among authors: yeom gy. Nanotechnology. 2023 Aug 29;34(46). doi: 10.1088/1361-6528/acec7a. Nanotechnology. 2023. PMID: 37531942

9

Selective isotropic etching of SiO₂ over Si₃N₄ using NF₃/H₂ remote plasma and methanol vapor.

Gil HS, Kim DS, Jang YJ, Kim DW, Kwon HI, Kim GC, Kim DW, Yeom GY. Gil HS, et al. Among authors: yeom gy. Sci Rep. 2023 Jul 18;13(1):11599. doi: 10.1038/s41598-023-38359-4. Sci Rep. 2023. PMID: 37463965 Free PMC article.

10

Plasma Enhanced Atomic Layer Deposition of Silicon Nitride for Two Different Aminosilane Precursors Using Very High Frequency (162 MHz) Plasma Source.

Ji YJ, Kim HI, Choi SY, Kang JE, Ellingboe AR, Chandra H, Lee CW, Yeom GY. Ji YJ, et al. Among authors: yeom gy. ACS Appl Mater Interfaces. 2023 Jun 14;15(23):28763-28771. doi: 10.1021/acsami.3c02950. Epub 2023 Jun 3. ACS Appl Mater Interfaces. 2023. PMID: 37269552

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