Controlled defect creation and removal in graphene and MoS2 monolayers.
Li DW, Zou QM, Huang X, Rabiee Golgir H, Keramatnejad K, Song JF, Xiao ZY, Fan LS, Hong X, Jiang L, Silvain JF, Sun S, Lu YF.
Li DW, et al. Among authors: xiao zy.
Nanoscale. 2017 Jul 6;9(26):8997-9008. doi: 10.1039/c7nr01712j.
Nanoscale. 2017.
PMID: 28638906