Fabrication of Diamond Submicron Lenses and Cylinders by ICP Etching Technique with SiO2 Balls Mask

Zongchen Liu; Tian-Fei Zhu; Yan-Feng Wang; Irfan Ahmed; Zhangcheng Liu; Feng Wen; Xiaofan Zhang; Wei Wang; Shuwei Fan; Kaiyue Wang; Hong-Xing Wang

doi:10.3390/ma12101622

Fabrication of Diamond Submicron Lenses and Cylinders by ICP Etching Technique with SiO₂ Balls Mask

Materials (Basel). 2019 May 17;12(10):1622. doi: 10.3390/ma12101622.

Authors

Zongchen Liu^{1

2}, Tian-Fei Zhu^{3

4}, Yan-Feng Wang^{5

6}, Irfan Ahmed⁷, Zhangcheng Liu^{8

9}, Feng Wen^{10

11}, Xiaofan Zhang^{12

13}, Wei Wang^{14

15}, Shuwei Fan^{16

17}, Kaiyue Wang^{18

19

20}, Hong-Xing Wang^{21

22}

Affiliations

¹ Institute of Wide Bandgap Semiconductors, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
² Key Lab for Physical Electronics and Devices of the Ministry of Education, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
³ Institute of Wide Bandgap Semiconductors, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
⁴ Key Lab for Physical Electronics and Devices of the Ministry of Education, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
⁵ Institute of Wide Bandgap Semiconductors, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
⁶ Key Lab for Physical Electronics and Devices of the Ministry of Education, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
⁷ Department of Electrical Engineering, Sukkur IBA University, Sukkur 65200, Pakistan. [email protected].
⁸ Institute of Wide Bandgap Semiconductors, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
⁹ Key Lab for Physical Electronics and Devices of the Ministry of Education, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
¹⁰ Institute of Wide Bandgap Semiconductors, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
¹¹ Key Lab for Physical Electronics and Devices of the Ministry of Education, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
¹² Institute of Wide Bandgap Semiconductors, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
¹³ Key Lab for Physical Electronics and Devices of the Ministry of Education, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
¹⁴ Institute of Wide Bandgap Semiconductors, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
¹⁵ Key Lab for Physical Electronics and Devices of the Ministry of Education, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
¹⁶ Institute of Wide Bandgap Semiconductors, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
¹⁷ Key Lab for Physical Electronics and Devices of the Ministry of Education, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
¹⁸ Institute of Wide Bandgap Semiconductors, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
¹⁹ Key Lab for Physical Electronics and Devices of the Ministry of Education, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
²⁰ School of Materials Science and Engineering, Taiyuan University of Science and Technology, Taiyuan 030024, China. [email protected].
²¹ Institute of Wide Bandgap Semiconductors, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].
²² Key Lab for Physical Electronics and Devices of the Ministry of Education, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China. [email protected].

Abstract

Submicron lenses and cylinders exhibiting excellent properties in photodetector and quantum applications have been fabricated on a diamond surface by an inductively-coupled plasma (ICP) etching technique. During ICP etching, a layer containing 500 nm diameter balls of SiO₂ was employed as mask. By changing the mixing ratio of O₂, Ar and CF₄ during ICP etching, several submicron structures were fabricated, such as cylinders and lenses. The simulation results demonstrated that such submicron structures on a diamond's surface can greatly enhance the photon out-coupling efficiency of embedded nitrogen-vacancy center.

Keywords: NV center; diamond; micro-optical devices; microstructure fabrication.

Abstract

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