Optimizing Josephson Junction Reproducibility in 30 kV E-beam Lithography: Analysis of Backscattered Electron Distribution
Authors:
A. M. Rebello,
L. M. Ruela,
G. Moreto,
N. Y. Klein,
E. Martins,
I. S. Oliveira,
F. Rouxinol,
J. P. Sinnecker
Abstract:
This paper explores methods to enhance the reproducibility of Josephson junctions, crucial elements in superconducting quantum technologies, when employing the Dolan technique in 30 kV e-beam processes. The study explores the influence of dose distribution along the bridge area on reproducibility, addressing challenges related to fabrication sensitivity. Experimental methods include E-beam lithogr…
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This paper explores methods to enhance the reproducibility of Josephson junctions, crucial elements in superconducting quantum technologies, when employing the Dolan technique in 30 kV e-beam processes. The study explores the influence of dose distribution along the bridge area on reproducibility, addressing challenges related to fabrication sensitivity. Experimental methods include E-beam lithography, with electron trajectory simulations shedding light on backscattered electron behavior. We demonstrate the fabrication of different junction geometries, revealing that some geometries significantly improve reproducibility by resulting in a more homogeneous dose distribution over the junction area.
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Submitted 28 March, 2024;
originally announced March 2024.
