Hole-mask colloidal nanolithography for large-area low-cost metamaterials and antenna-assisted surface-enhanced infrared absorption substrates

ACS Nano. 2012 Jan 24;6(1):979-85. doi: 10.1021/nn2047982. Epub 2011 Dec 29.

Abstract

We use low-cost hole-mask colloidal nanolithography to manufacture large-area resonant split-ring metamaterials and measure their infrared optical properties. This novel substrate is employed for antenna-assisted surface-enhanced infrared absorption measurements using octadecanethiol (ODT) and deuterated ODT, which demonstrates easy adjustability of our material to vibrational modes. Our method has the potential to make resonant plasmon-enhanced infrared spectroscopy a standard lab tool in biology, pharmacology, and medicine.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Absorption
  • Colloids
  • Infrared Rays
  • Materials Testing
  • Nanostructures / chemistry*
  • Nanostructures / ultrastructure*
  • Particle Size
  • Photography / methods*
  • Porosity
  • Refractometry
  • Surface Plasmon Resonance / methods*

Substances

  • Colloids