A step towards accreditation: A robustness test of etching process

F Leonardi; M Veschetti; S Tonnarini; F Cardellini; R Trevisi

doi:10.1016/j.apradiso.2015.05.002

A step towards accreditation: A robustness test of etching process

Appl Radiat Isot. 2015 Aug:102:93-97. doi: 10.1016/j.apradiso.2015.05.002. Epub 2015 May 7.

Authors

F Leonardi¹, M Veschetti², S Tonnarini², F Cardellini³, R Trevisi²

Affiliations

¹ INAIL (Italian National Workers Compensation Authority)- Research Sector - Department of Occupational Hygiene 00040 Monteporzio Catone, Rome, Italy. Electronic address: [email protected].
² INAIL (Italian National Workers Compensation Authority)- Research Sector - Department of Occupational Hygiene 00040 Monteporzio Catone, Rome, Italy.
³ INMRI-ENEA (National Institute of Ionizing Radiation Metrology)- Casaccia, 00133 Rome, Italy.

PMID: 26002275
DOI: 10.1016/j.apradiso.2015.05.002

Abstract

In the present study the robustness of the etching process used by our laboratory was assessed. The strategy followed was based on the procedure suggested by Youden. Critical factors for the process were estimated using both Lenth's method and Dong's algorithm. The robustness test evidences that particular attention needs to be paid to the control of the etching solution's temperature.

Keywords: Etching process; Method validation; Radon; Robustness; SSNTD.