Comparison of Electrical and Photoelectrical Properties of ReS₂ Field-Effect Transistors on Different Dielectric Substrates

As one of the newly discovered transition-metal dichalcogenides (TMDs), rhenium disulfide (ReS₂) has been investigated mostly because of its unique characteristics such as the direct band gap nature even in bulk form, which is not prominent in other TMDs (e.g., MoS₂, WSe₂, etc.). However, this material possesses a low mobility and an on/off ratio, which restrict its usage in high-speed and fast switching applications. Low mobilities or on/off ratios can also be caused by substrate scattering as well as environmental effects. In this study, we used few-layer ReS₂ (FL-ReS₂) as a channel material to investigate the substrate-dependent mobility, current on/off ratio, Schottky barrier height (SBH), and trap density of states of different dielectric substrates. The hexagonal boron nitride (h-BN)/FL-ReS₂/h-BN structure was observed to exhibit a high mobility of 45 cm² V^-1 s^-1, current on/off ratio of about 10⁷, the lowest SBH of about 12 mV at a zero back-gate voltage ( V_bg), and a low trap density of states of about 5 × 10¹³ cm^-3. These quantities are reasonably superior compared to the FL-ReS₂ devices on SiO₂ substrates. We also observed a nearly 5-fold improvement in the photoresponsivity and external quantum efficiency values for the FL-ReS₂ devices on h-BN substrates. We believe that the photonic characteristics of TMDs can be improved by using h-BN as the substrate and capping layer.