Szeghalmi A - Search Results

1

Multilayer Fresnel zone plate for soft X-ray microscopy resolves sub-39nm structures.

Mayer M, Grévent C, Szeghalmi A, Knez M, Weigand M, Rehbein S, Schneider G, Baretzky B, Schütz G. Mayer M, et al. Among authors: szeghalmi a. Ultramicroscopy. 2011 Dec;111(12):1706-11. doi: 10.1016/j.ultramic.2011.09.003. Epub 2011 Sep 17. Ultramicroscopy. 2011. PMID: 22088445

2

Atomic layer deposition of Al2O3 and TiO2 multilayers for applications as bandpass filters and antireflection coatings.

Szeghalmi A, Helgert M, Brunner R, Heyroth F, Gösele U, Knez M. Szeghalmi A, et al. Appl Opt. 2009 Mar 20;48(9):1727-32. doi: 10.1364/ao.48.001727. Appl Opt. 2009. PMID: 19305471

3

Flexible replication technique for high-aspect-ratio nanostructures.

Szeghalmi A, Sklarek K, Helgert M, Brunner R, Erfurth W, Gosele U, Knez M. Szeghalmi A, et al. Small. 2010 Dec 6;6(23):2701-7. doi: 10.1002/smll.201000169. Small. 2010. PMID: 21069891

4

Iridium wire grid polarizer fabricated using atomic layer deposition.

Weber T, Käsebier T, Szeghalmi A, Knez M, Kley EB, Tünnermann A. Weber T, et al. Among authors: szeghalmi a. Nanoscale Res Lett. 2011 Oct 25;6(1):558. doi: 10.1186/1556-276X-6-558. Nanoscale Res Lett. 2011. PMID: 22023700 Free PMC article.

5

Efficient focusing of 8 keV X-rays with multilayer Fresnel zone plates fabricated by atomic layer deposition and focused ion beam milling.

Mayer M, Keskinbora K, Grévent C, Szeghalmi A, Knez M, Weigand M, Snigirev A, Snigireva I, Schütz G. Mayer M, et al. Among authors: szeghalmi a. J Synchrotron Radiat. 2013 May;20(Pt 3):433-40. doi: 10.1107/S0909049513006602. Epub 2013 Apr 9. J Synchrotron Radiat. 2013. PMID: 23592622 Free PMC article.

6

Multilayer Fresnel zone plates for high energy radiation resolve 21 nm features at 1.2 keV.

Keskinbora K, Robisch AL, Mayer M, Sanli UT, Grévent C, Wolter C, Weigand M, Szeghalmi A, Knez M, Salditt T, Schütz G. Keskinbora K, et al. Among authors: szeghalmi a. Opt Express. 2014 Jul 28;22(15):18440-53. doi: 10.1364/OE.22.018440. Opt Express. 2014. PMID: 25089463 Free article.

7

Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography.

Bourgin Y, Siefke T, Käsebier T, Genevée P, Szeghalmi A, Kley EB, Zeitner UD. Bourgin Y, et al. Among authors: szeghalmi a. Opt Express. 2015 Jun 29;23(13):16628-37. doi: 10.1364/OE.23.016628. Opt Express. 2015. PMID: 26191675 Free article.

8

Encapsulation process for diffraction gratings.

Ratzsch S, Kley EB, Tünnermann A, Szeghalmi A. Ratzsch S, et al. Among authors: szeghalmi a. Opt Express. 2015 Jul 13;23(14):17955-65. doi: 10.1364/OE.23.017955. Opt Express. 2015. PMID: 26191855 Free article.

9

Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching.

Ghazaryan L, Kley EB, Tünnermann A, Szeghalmi A. Ghazaryan L, et al. Among authors: szeghalmi a. Nanotechnology. 2016 Jun 24;27(25):255603. doi: 10.1088/0957-4484/27/25/255603. Epub 2016 May 13. Nanotechnology. 2016. PMID: 27176497

10

Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications.

Shestaeva S, Bingel A, Munzert P, Ghazaryan L, Patzig C, Tünnermann A, Szeghalmi A. Shestaeva S, et al. Among authors: szeghalmi a. Appl Opt. 2017 Feb 1;56(4):C47-C59. doi: 10.1364/AO.56.000C47. Appl Opt. 2017. PMID: 28158051

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