Effect of Metal Oxide Deposition on the Sensitivity and Resolution of E-Beam Photoresist.
Dong X, Shao Y, Ping H, Tong X, Wu Y, Zhang Y, Wang M, Zheng Z, Zhao J, Wang J, Guo Z, Zhuang L, Xu Y.
Dong X, et al. Among authors: ping h.
ACS Appl Mater Interfaces. 2024 Oct 1. doi: 10.1021/acsami.4c08591. Online ahead of print.
ACS Appl Mater Interfaces. 2024.
PMID: 39353141