Effect of Cl2 Radical on Dry Development of Spin-Coated Metal Oxide Resist.
Namgoong S, Kim HJ, Kang YK, Kim MC, Jang YJ, Tak H, Kang JE, Lee SJ, Kim MG, Kim D, Yeom GY.
Namgoong S, et al.
ACS Appl Mater Interfaces. 2024 Sep 25;16(38):51690-51698. doi: 10.1021/acsami.4c10523. Epub 2024 Sep 12.
ACS Appl Mater Interfaces. 2024.
PMID: 39265086