Chemical vapor deposition (Q505668): Difference between revisions
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Revision as of 04:23, 23 December 2018
chemical process used in the semiconductor industry to produce thin films
| Sprache | Label | Description | Also known as |
|---|---|---|---|
| Englisch | Chemical vapor deposition |
chemical process used in the semiconductor industry to produce thin films |
Statements
1852
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Chemical vapour deposition
0 references
Identifiers
Sitelinks
Wikipedia(29 entries)
- arwiki ترسيب كيميائي للبخار
- bgwiki CVD
- cawiki Deposició química de vapor
- cswiki Chemická depozice z plynné fáze
- dawiki CVD
- dewiki Chemische Gasphasenabscheidung
- enwiki Chemical vapor deposition
- eswiki Deposición química de vapor
- etwiki Keemiline sadestamine aurufaasist
- fawiki انباشت به روش تبخیر شیمیایی
- fiwiki Kemiallinen kaasufaasipinnoitus
- frwiki Dépôt chimique en phase vapeur
- huwiki Kémiai gőzfázisú leválasztás
- idwiki Pengendapan uap kimia
- itwiki Deposizione chimica da vapore
- jawiki 化学気相成長
- kowiki 화학기상증착
- mnwiki Химийн уураар тунадасжуулах
- nlwiki Chemical vapor deposition
- plwiki Chemiczne osadzanie z fazy gazowej
- ptwiki Deposição química em fase vapor
- rowiki Depunere chimică în fază de vapori
- ruwiki Химическое осаждение из газовой фазы
- simplewiki Chemical vapor deposition
- slwiki Nanašanje tankih plasti
- tawiki வேதி ஆவிப் படிவு
- trwiki Kimyasal buhar biriktirme
- ukwiki Хімічне осадження з парової фази
- zhwiki 化学气相沉积